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Updated: Jan 29, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

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Published on: September 14, 2018

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对商业ELP-20电子束刻字电阻器的全面调查

Meruert Qairat1, Aliya Alzhanova1,2, Mustakhim Pshikov1

  • 1National Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty 050040, Kazakhstan.

Micromachines
|January 28, 2026
PubMed
概括

本研究详细介绍了正色电阻ELP-20的细节,揭示了其甲酸盐结构和薄膜特性. ELP-20表现出一致的厚度和有效分子量,其灵敏度与电子束 lithography 相似.

关键词:
在ELP-20中抵抗.对比对比对比的对比对比对比的对比对比对比的对比对比对比的对比对比对比对比对比对比对比对比对比对比对比对比对比对比对比对比对比对比对比对比对比对比电子束光刻法 (EBL) 是一种电子束光刻法.灵敏度 灵敏度 灵敏度 灵敏度 灵敏度螺旋涂层的使用方法

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