通过选择性和直接的激光图案在面具内部实现的光罩传输不连续性的平滑的临界维度补偿
Dabin Park1, Geumsu Yeom1, Sungho Jeong2
1School of Mechanical Engineering & Advanced Machinery Technology Research Institute, Kunsan National University, Gunsan-si 54150, Republic of Korea.
Micromachines
|January 28, 2026
概括
光罩内部的激光图案纠正了大面积光刻画中的关键维度不均. 这种技术精确地控制着光罩的透射率,即使在突然的变化中,也确保了平滑的临界维度行为.
科学领域:
- 摄影石刻法 (photolithography) 是一种摄影方式.
- 材料科学 材料科学 材料科学
- 光学工程是指光学工程.
背景情况:
- 带有细分照明的大面积光刻系统可能因过度曝光而遭受临界维度 (CD) 不均.
- 现有的CD控制方法在复杂的光刻装置中可能缺乏精度或实用性.
研究的目的:
- 为了研究在光罩内应用的选择性激光图案技术,以减轻CD的不均性.
- 分析激光图案对光罩透射率的影响及其对CD控制的影响.
主要方法:
- 选择性激光图案应用于光罩,以创建受控的空隙.
- 在不同激光条件下分析了激光诱导空洞的几何特征.
- 通过调整激光参数,空隙密度,图案排列和分层来调节光罩传输率.
- 在具有不同传导度水平的区域中评估了CD行为,包括突然过渡.
主要成果:
- 空洞的大小和形态可以通过激光脉冲能量调节,并定义了处理窗口,以防止面具骨折.
- 使用激光图案,光罩的透射率从20%到92%被精确控制.
- 通过纳米到几十纳米的精度实现了CD补偿.
- 在突如其来的传导度边界 (例如,80%至50%) 之间观察到平滑的CD变化,防止CD的急剧转移.
结论:
- 选择性激光图案在光罩内是一个实用和有效的方法,用于CD补偿.
- 这种技术成功地减轻了CD非均性在大面积 lithography与细分照明.
- 精确控制光罩透射率的能力使得CD控制功能强大,即使在具有挑战性的光刻场景中也是如此.
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