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探索量子点激光器对于无隔离器光子集成电路的反极限

Ying Shi¹, Bozhang Dong¹, Xiangpeng Ou¹

¹Integrated Photonics Lab, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Kingdom of Saudi Arabia.

Light, science & applications

|January 29, 2026

概括

量子点 (QD) 激光器对光学反具有显著的耐受性,在-6.7dB时达到连贯性崩. 这一突破使得无隔离器的光子集成电路 (PIC) 具有更高的可靠性.

科学领域:

光子学是一个光子学.
半导体激光器半导体激光器
材料科学材料科学材料科学

背景情况:

在光子集成电路 (PIC) 中,来自芯片组件的光学反挑战了光子集成电路 (PIC) 中稳定的激光操作.
量子点 (QD) 激光器由于有利的线宽增强因子和阻尼率,提供了无隔离器集成的潜力.
之前对QD激光反耐受性的研究仅限于-10dB,在更强的反条件下,其性能未被探索.

研究的目的:

在超出先前实验极限的条件下,全面评估优化QD激光器的反耐受性.
在强光反下确定QD激光器的连贯性崩 (CC) 值.
建立使用QD激光技术的无隔离器PIC的实际设计规则.

主要方法:

通过先进的表轴生长和制造技术优化QD激光器.
开发一个专门的光学设置,以提供高达0dB的反水平.
激光性能的实验性表征,包括连贯性崩,数据传输,热稳定性和设备可重现性.

主要成果:

在 -6.7 dB的反 (-21.4%的反功率) 观察到一致性崩 (CC),明显超过量子井 (QW) 激光器的耐受性.
经过证明,无处罚的10Gbps运行具有强大的热稳定性 (在15-45°C以上±0.5dB漂移) 和高可重现性 (±0.3dB).
建模表明,在现实的PIC空腔中,反耐受性更大,性能与混合DFB-共振器平台相美.

结论:

优化的QD激光器对光学反具有前所未有的耐受性,使可靠的无隔离器PIC成为可能.
这些发现提供了关键的设计指南,用于将QD激光集成到实际的PIC中.
对于反强大的PIC应用,QD激光器是其他激光类型的优越替代品.

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