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在-氧集群上进行原子精确的界面工程,用于8nm以下的石版
Jian Wei1, Ni Zhen1, Zuohu Zhou1
1Institute of Modern Optics, Tianjin Key Laboratory of Micro-scale Optical Information Science and Technology, Nankai University, Tianjin, P. R. China.
Angewandte Chemie (International ed. in English)
|February 3, 2026
概括
我们开发了新型的氧集群 (TOCs),用于高NA EUV光刻. 这项创新实现了具有增强粘合力的8nm以下图案,为光电阻性能设定了新的基准.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 半导体制造业 半导体制造业
背景情况:
- 锡氧集群 (TOCs) 是对高数值孔径极紫外线 (High-NA EUV) 光刻的有前途的光电阻.
- 增强光电阻和基板之间的附着性对于高分辨率图案设计至关重要.
研究的目的:
- 将TOC功能化为西兰基,以提高对二氧化基板的附着性.
- 为了在8nm以下的尺度上实现超高分辨率的图案,使用新型的Sn-Si oxo集群电阻.
主要方法:
- TOCs的表面功能化与化物部分.
- 高NA EUV石版为图案制作.
- 用光谱分析和理论计算来阐明反应机制.
主要成果:
- 成功实现了8nm以下的尺度图案,这是TOC光电阻的最佳性能.
- 证明Si部分的双重功能:捕获二次电子并增强基质粘附.
- 形成各种Sn-O-Sn/Sn-O-Si/Si-O-Si网络,从而实现更高的分辨率和更低的线边粗度 (LER).
结论:
- 引入了一种新家族的Sn-Si oxo集群光电阻.
- 原子级接口工程是下一代半导体制造的可行策略.
- 开发的电阻为先进的光刻应用提供了卓越的分辨率和附着性.
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