低温Ru-Ru混合结合:Ar/H2等离子体和NH4OH协同激活用于超高密度互连

Yufei Bai1, Jia Yang1, Xinze Li1

  • 1State Key Laboratory of Precision Welding & Joining of Materials and Structures, Harbin Institute of Technology, Harbin 150001, China.

PubMed
概括

对于先进的电子产品而言,的结合现在可以在低温下实现. 一种新的Ar/H2等离子和NH4OH处理使可靠,高强度的相互连接成为可能,为在集成电路中取代铜铺平了道路.

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