BWD-DETR:一个强大的框架,用于明亮场晶圆缺陷检测.
Ruilou Zhang1,2,3, Xiangji Guo1,2, Yuankang Xu1,2
1Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China.
Sensors (Basel, Switzerland)
|February 13, 2026
概括
这项研究引入了BWD-DETR,这是一个新的框架,用于使用明亮场成像检测小晶圆表面缺陷. 该方法显著改善了微米以下缺陷的检测,提高了半导体制造的准确性.
科学领域:
- 半导体制造业 半导体制造业
- 光学检查 视觉检查 视觉检查 视觉检查
- 计算机视觉 计算机视觉
背景情况:
- 亮场光学成像是晶圆缺陷检测的标准.
- 由于背景噪音和纹理,图案晶圆上的小颗粒缺陷具有挑战性.
- 现有的方法在微米以下缺陷的检测性和定位准确性方面扎.
研究的目的:
- 在明亮场成像下开发一个用于晶圆表面缺陷的先进检测框架.
- 为了提高检测和定位小和亚微米缺陷的准确性.
- 为了克服当前明亮场成像技术的局限性.
主要方法:
- 根据RT-DETR基线提出的BWD-DETR框架.
- 集成一个波纹骨干,以增强特征提取.
- 包括SMFI和CAS-Fusion模块用于改进故障信号处理.
主要成果:
- 在明亮场晶圆缺陷检测中实现了96.56%的AP50和54.94%的AP50:95.
- 与基线相比,表现出1.64% (AP50) 和2.17% (AP50:95) 的性能改善.
- 成功增强了微米以下缺陷的检测能力.
结论:
- 该BWD-DETR框架为明亮场晶圆缺陷检测提供了卓越的性能.
- 提出的方法有效地解决了小缺陷和复杂背景所带来的挑战.
- 这种方法促进了半导体制造中的自动化检查.
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