用正负压灌技术评估墙壁剪切应力和ex vivo涂抹层去除
Wan NurFarhana Wan Abdul Rahman1, Nurul Ain Ramlan1, Ahmad Hussein Abdul Hamid2
1Centre of Comprehensive Care Studies, Faculty of Dentistry, University Teknologi MARA, Malaysia.
European endodontic journal
|February 13, 2026
概括
与EndoVac和侧通风技术相比,修改后的顶部负压 (mANP) 系统显示出更好的涂抹层去除和更高的墙壁剪切应力 (WSS). 这表明WSS大小与根通道中有效的涂抹层去除之间存在直接的相关性.
科学领域:
- 牙周内科医院 牙周内科医院 牙周内科医院
- 生物材料科学 生物材料科学
- 流体动力学 流体动力学
背景情况:
- 有效的根管灌对于去除涂抹层 (SL) 和碎片至关重要.
- 墙壁剪切应力 (WSS) 在灌效率中起着重要作用.
- 新型灌系统旨在改善SL移除和WSS生成.
研究的目的:
- 为了比较修改的顶部负压 (mANP) 系统与EndoVac和侧通风 (SV) 正压灌技术的WSS和SL去除功效.
- 为了研究WSS大小和SL移除效率之间的关系.
主要方法:
- 计算流体动力学 (CFD) 模拟用于分析每个系统的3D根管模型中的WSS模式.
- 使用EndoVac,mANP或SV技术准备和灌了60个提取的前.
- 扫描电子显微镜 (SEM) 评估了涂抹层的去除,并使用费舍尔精确测试分析了结果.
主要成果:
- 根据CFD分析,mANP产生的WSS平均值最高 (11.06Pa),其次是SV (10.72Pa) 和EndoVac (10.48Pa).
- SEM评估显示,与EndoVac和SV相比,mANP系统的涂抹层去除明显优于mANP系统.
- 在较高的平均WSS大小和改善的SL去除之间观察到直接相关性.
结论:
- 在产生更高的WSS和实现比EndoVac和SV技术更清洁的涂抹层去除方面,mANP系统更有效.
- 这项研究证实了WSS大小与在内牙灌中涂抹层去除的有效性之间的直接相关性.
- 这些发现支持mANP作为一种先进的灌技术的潜力,以改善根管清洁.
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