概括
我们开发了使用高波生成 (HHG) 源的极紫外线 (EUV) 光谱圆测量 (SE). 这种方法准确地确定了Nb2O5,Mo和Au等材料的光学常数,使精确的EUV光学分析成为可能.
科学领域:
- 材料科学 材料科学 材料科学
- 光学和光子学 在光学和光子学.
- 频谱学是一种光谱学.
背景情况:
- 精确的光学常数确定对于材料的表征和光学系统的设计至关重要.
- 极紫外线 (EUV) 光谱学由于高光子能量和有限的源可用性而存在独特的挑战.
研究的目的:
- 证明使用桌面高生成 (HHG) 源用于极紫外线 (EUV) 光谱圆测量 (SE) 的可行性.
- 为了能够精确地确定EUV光谱范围内的复杂折射率 (n-ik).
主要方法:
- 开发一个极化分辨率EUV光谱圆测量系统.
- 使用一个紧的桌面高生成 (HHG) 源用于EUV光生成.
- 使用已知的Nb2O5膜验证系统,并对Mo和Au镜像光学常数进行间接分析.
主要成果:
- 通过使用高生成 (HHG) 源成功实施了EUV光谱圆测量 (SE).
- 对Nb2O5膜的复杂折射率 (n-ik) 的准确检索.
- 在EUV范围内对和金镜子的验证光学常量.
结论:
- 开发的EUV光谱圆测量 (SE) 系统提供了一个紧而通用的平台,用于精确的光学常量测定.
- 该技术适用于EUV频谱中的材料和光学元件的表征.
- 该系统有可能在未来在EUV系统中进行超快速研究.
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