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工作记忆和干扰控制对强化学习的影响:来自计算建模和结构性MRI的证据

Mengxin Wen¹, Chengyan Yang², Tongran Liu²

¹State Key Laboratory of Cognitive Science and Mental Health, Institute of Psychology, Chinese Academy of Sciences, Beijing, China; Department of Psychology, University of Chinese Academy of Sciences, Beijing, China; Sino-Danish College, University of Chinese Academy of Sciences, Beijing, China.

|February 21, 2026

概括

工作记忆和干扰控制共同影响强化学习 (RL),并与大脑结构有关. 高工作记忆负载和干扰损害学习,与灰质体积和皮质厚度相关的影响.

科学领域:

认知神经科学认知神经科学
神经成像是一种神经成像.
计算精神病学是一种计算精神病学.

背景情况:

强化学习 (RL) 对于适应动态环境至关重要.
虽然研究了工作记忆 (WM) 对RL的影响,但WM和干扰控制 (IC) 的组合作用及其神经支柱的理解较少.

研究的目的:

调查WM和IC对RL的联合贡献.
探索WM,IC,RL表现和大脑形态学的关系.

主要方法:

169个健康的成年人执行了一个概率性RL任务,具有不同的WM负载和干扰.
测量了RL模型参数 (学习率,逆温度,遗忘) 和学习准确性.
从144名参与者获得结构性MRI数据 (GMV,皮质厚度,深).

主要成果:

增加WM负载会影响学习准确度,学习速度降低,并减缓遗忘,与前端对象/边缘网络形态相关.
干扰暴露降低了学习速度,加速了遗忘,IC效应与带回膜状深度有关.
一个显著的相互作用显示干扰,特别是在高WM负载下受损的学习,与thalamic和极结构相关.

结论:

智能化和智能化相互影响,塑造学习过程,影响自适应性决策.
学习的个体差异与特定的皮质和皮质下大脑结构特征有显著的关联.
这些发现突出了复杂的学习环境中认知控制的神经基础.

关键词:

皮层厚度皮层厚度灰色物质的体积,灰色物质的体积.干扰控制干扰控制强化学习是一种强化学习.结构性核磁共振成像 (MRI)硫深度是指的深度.工作记忆工作记忆

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