设计和模拟一个p型双交桥树FET与全面的直流,模拟/射频和线性分析,用于CMOS电路应用
1School of Electronics Engineering, VIT-AP University, Beside AP Secretariat, Amaravati, 522241, India.
Scientific reports
|February 26, 2026
概括
研究人员设计了一种新的p型双交桥树形场效应晶体管 (DIB-TreeFET) 用于三纳米以下节点. 这种先进的晶体管设计显著提高了性能,并为下一代RF系统芯片应用提供了有前途的解决方案.
科学领域:
- 半导体设备物理学 半导体设备物理
- 纳米电子学纳米电子学
- 集成电路设计 集成电路设计
背景情况:
- 在3nm以下节点的传统场效应晶体管 (FET) 中扩展挑战.
- 需要在先进的晶体管中加强静电控制和减少短通道效应.
- 设备电路共同设计对于高性能纳米级应用的重要性.
研究的目的:
- 介绍一款新型p型双交桥树形场效应晶体管 (DIB-TreeFET) 的设计和电路级验证.
- 调查DIB-TreeFET架构提供的性能增强,包括高k间隔器的影响.
- 通过电路模拟来评估 DIB-TreeFET 对模拟/射频应用的适用性.
主要方法:
- 使用TCAD工具进行设备级模拟,以分析DIB-TreeFET特征.
- 高k间隔器 (HfO2) 的整合和与空气间隔器的比较.
- 使用DIB-TreeFET模型,对三级电流饥饿环电压控制振荡器 (VCO) 的混合模式模拟.
主要成果:
- DIB-TreeFET表现出显著的改进:38.9%更高的ON电流,15.1%降低的下值波动,46.5%更低的排水诱导屏障降低 (DIBL).
- 通过导率的75.4%的改善表明了优越的模拟/射频性能.
- 模拟的VCO实现了20.48GHz的宽频调范围,运行稳定.
结论:
- DIB-TreeFET架构有效地增强了静电控制,并减少了低于3nm技术节点的短通道效应.
- 使用高k间距器,特别是HfO2,对于通过增加门容量和改进门通道合来最大限度地提高设备性能至关重要.
- DIB-TreeFET显示出作为未来纳米级CMOS和RF系统芯片 (SoC) 应用的关键启用设备的巨大潜力,通过成功的电路级模拟来验证.
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