4H-SiC,

Yufang Wang1, Zhixiong Li2, Fengjun Chen3

  • 1College of Intelligent Manufacturing, Hunan Open University, Changsha 410004, China.

Micromachines
|February 27, 2026
PubMed
概括

这项研究优化了4H-SiC晶片的切片参数,以尽量减少切片缺陷. 了解材料去除机制是提高半导体制造质量的关键.

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