4.11 A/1650 V 蓝宝石基板 GaN MIS-HEMT 具有薄缓冲器,用于中压电源应用
Changhao Chen1, Yang Liu1, Xiaowei Zhou1,2
1School of Advanced Materials and Nanotechnology, Xidian University, Xi'an 710071, China.
Micromachines
|February 27, 2026
概括
蓝宝石基板使高压化 (GaN) 电源设备具有成本效益,使用薄的缓冲层. 这些GaN金属绝缘体半导体高电子移动性晶体管 (MIS-HEMT) 显示出卓越的断裂电压和运行稳定性.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 半导体物理 半导体物理
背景情况:
- 基于 (Si) 的化 (GaN) 功率装置需要厚厚的缓冲层,因为Si的分解电场较低,增加了成本.
- 蓝宝石基板提供高电绝缘性和机械强度,为GaN电源设备提供了可行的替代方案.
研究的目的:
- 通过使用薄的缓冲层在蓝宝石基板上的GaN金属绝缘体半导体高电子流动性晶体管 (MIS-HEMT) 展示一个CMOS兼容的工艺.
- 评估这些蓝宝石基的GaN MIS-HEMT在中压应用中的性能和可靠性.
主要方法:
- 在使用薄薄的缓冲层的蓝宝石基板上制造GaN MIS-HEMT.
- 关闭状态故障电压,启动状态电流,值电压 (VTH) 和电阻 (RON) 的表征.
- 设备参数的统计分析和动态RON,泄漏电流和高温反向偏差 (HTRB) 可靠性的评估.
主要成果:
- 在WG=20.4mm和LGD=24μm的器件中,实现的非状态故障电压>1650V和最大状态电流>4.1A.
- 在晶圆上展示了VTH和RON的紧密统计分布.
- 通过HTRB测试,在高温 (150°C) 中确认了运行可行性,并通过HTRB测试对650V运行验证了长期可靠性.
结论:
- 基于蓝宝石的GaN MIS-HEMT具有薄的缓冲层,为中压电源应用提供了具有成本效益的解决方案.
- 制造的设备表现出优异的高压性能,良好的统一性,在高温下强大的可靠性.
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