通过集成暗场散射和衍射相显微镜,对无图案晶圆进行高灵敏度缺陷检查
Xiangchao Zhang1,2, Qianru Zheng2, Di Li3
1Jianghuai Advanced Technology Center, Hefei 230088, China.
Sensors (Basel, Switzerland)
|February 27, 2026
概括
一个新的双通道光学检查系统结合了暗场散射和衍射相显微镜,用于敏感的晶圆缺陷检测. 这种先进的技术提高了半导体制造的灵敏度和可靠性.
科学领域:
- 半导体制造业 半导体制造业
- 光学计量学 在光学计量学
- 材料科学 材料科学 材料科学
背景情况:
- 传统的晶圆缺陷检查方法缺乏足够的灵敏度和可靠性.
- 先进的半导体制造需要在缺陷检测方面更高的精度.
研究的目的:
- 开发一种新的双通道光学检查系统,用于增强晶圆缺陷的特征.
- 提高无图案晶圆缺陷检测的灵敏度和可靠性.
主要方法:
- 将暗场散射和衍射相位显微镜集成到一个单一系统中.
- 同时获取来自缺陷的暗场强度和相梯度信号.
- 实验验证使用聚乙烯颗粒进行检测限值评估.
主要成果:
- 实现了对晶圆缺陷的60nm检测极限.
- 与单个暗场散射系统相比,表现出更好的灵敏度.
- 维护横向和垂直维度的小规模缺陷的检测极限.
结论:
- 拟议的双通道系统为无图案晶圆缺陷检查提供了高灵敏度和可靠性.
- 这项技术满足了先进半导体制造的严格要求.
- 综合方法使纳米尺度的综合缺陷表征成为可能.
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