相关实验视频
Updated: Mar 1, 2026

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20 mJ, 1 ps Yb:YAG Thin-disk Regenerative Amplifier
Published on: July 12, 2017
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101 W,sub-400 fs Yb:Lu2O3 薄盘再生放大器
Optics letters
|February 27, 2026
概括
研究人员开发了一种Yb:Lu2O3薄盘再生放大器,在400fs以下的脉冲下实现了101W的平均功率. 这一突破使得使用超快激光器的先进工业和科学应用成为可能.
科学领域:
- 激光物理 激光物理
- 材料科学 材料科学 材料科学
背景情况:
- 薄盘再生放大器对于高功率超快激光系统至关重要.
- Yb:Lu2O3陶为激光应用提供了有前途的性能.
研究的目的:
- 为了展示第一个Yb:Lu2O3薄盘再生放大器.
- 为了实现超短脉冲持续时间的高平均功率.
主要方法:
- 使用Yb:Lu2O3陶增益介质在薄盘配置.
- 采用再生放大来实现高脉冲能量和平均功率.
- 实施了脉冲压缩技术,以达到400 fs以下的持续时间.
主要成果:
- 产生了363 fs脉冲,中心在1033 nm.
- 实现了101W的压缩平均功率.
- 在96.5 kHz的重复率下运行.
- 证明同时具有高平均功率 (>100 W) 和超短脉冲持续时间 (<400 fs).
结论:
- Yb:Lu2O3薄盘再生放大器代表了超快激光技术的重大进步.
- 该系统超过了以前用于薄盘再生放大器的性能基准.
- 展示的功能为工业加工和科学研究开辟了新的途径,需要高功率的超短激光脉冲.
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