无参考定量质谱能够对抗性聚合物进行测序,并揭示了依赖于序列的去保护灵敏度
Yusuke Hibi1, Yasuyuki Nakamura1, Shiho Uesaka1
1Data-Driven Polymer Design Group, Research Center for Macromolecules and Biomaterials, National Institute for Materials Science (NIMS); 1-2-1, Sengen, Tsukuba, Ibaraki 305-0047, Japan.
Macromolecules
|March 2, 2026
概括
使用 pyrolysis 质谱法 (pyrolysis-MS) 的新测序方法解读了阻抗聚合物中的单体顺序. 这一突破揭示了依赖序列的聚合物不稳定性,这对于理解和控制半导体光刻画中的线边粗度 (LER) 至关重要.
科学领域:
- 材料科学 材料科学 材料科学
- 聚合物化学 聚合物化学
- 半导体制造业 半导体制造业
背景情况:
- 线边粗度 (LER) 是半导体光刻画中的一个关键挑战.
- 由于缺乏有效的测序技术,单体序列对抗性聚合物中LER的影响仍然不太清楚.
- 现有的测序方法不足以分析复杂的抗聚合物结构.
研究的目的:
- 开发一种新的对抗聚合物测序方法.
- 为了研究单体序列和聚合物在 lithographic 过程中的行为之间的关系.
- 为了能够分析序列-LER相关性,以改进半导体制造.
主要方法:
- 利用热解质谱法 (pyrolysis-MS) 来量化电阻聚合物的短序频率.
- 采用计算建模来分析依赖序列的脱聚合和侧链裂变.
- 开发了一种结合质量和温度域的策略,用于聚合物测序.
主要成果:
- 成功测序了以甲基酸盐为基础的抗性共聚合物,此前被认为是无法获得的.
- 证明高分子在热解过程中的不稳定性依赖于序列,在分解温度配置中编码信息.
- 确定了依赖序列的侧链不稳定性,这表明序列影响了去保护过程.
结论:
- 开发的 pyrolysis-MS 策略可以对复杂的抗性聚合物进行测序.
- 这些发现为揭开半导体光刻学中长期存在的序列-LER关系提供了一条道路.
- 这项工作通过精确的聚合物序列设计为控制LER开辟了新的途径.
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