约哈里-戈尔德斯坦放松在灭和辐射的石灰玻璃中
Jacopo Baglioni1, Alessandro Martinelli1, Peihao Sun1
1Department of Physics and Astronomy "Galileo Galilei", University of Padova, Via F. Marzolo 8, 35131 Padova, Italy.
概括
玻璃中的Johari-Goldstein (JG) 放松与局部缺陷区域有关. X射线辐射提供了一种新的方法来控制这种放松,并影响玻璃的性能.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 物理化学 物理化学
背景情况:
- 玻璃过渡涉及结构放松和二次Johari-Goldstein (JG) 放松.
- JG放松显著影响玻璃的关键性质,如塑性反应.
- 研究JG放松动态是了解玻璃行为的关键.
研究的目的:
- 为了研究 Johari-Goldstein (JG) 放松在高度 GeSe3 眼镜中.
- 探索使JG放松在热量计测量中可观测的方法.
- 在玻璃网络中建立JG放松和缺陷区域之间的联系.
主要方法:
- 使用快速扫描热量计来研究GeSe3眼镜.
- 通过增加冷却速度来达到高度状态.
- 通过玻璃的X射线辐射诱导高度状态.
主要成果:
- 增加的冷却速度和X射线辐射使得JG放松可检测.
- JG放松表现为玻璃过渡温度以下的外热信号.
- 确定了JG放松与移动区域的火或缺陷区域的辐射.
结论:
- 证实了JG放松和玻璃网络中的局部缺陷区域之间的强烈联系.
- 证明X射线照射是一种控制JG放松的新策略.
- 突出了通过控制JG放松来调整玻璃机械性能的潜力.
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