积极屏蔽的梯度线圈设计,用于完全超导平面MRI系统,使用逐步增强的屏蔽约束
Yiqing Yin1, Wenchen Wang2, Guyue Zhou3
1Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, China; School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing 100049, China.
Magnetic resonance imaging
|March 6, 2026
概括
本研究介绍了用于超导磁共振成像 (MRI) 系统的增强屏蔽线圈设计. 该方法优化了梯度线圈性能,并抑制了迷路磁场,确保了冷稳定性.
科学领域:
- 医疗成像医学成像
- 应用物理 应用物理
- 超导磁铁技术 超导磁铁技术 超导磁铁技术
背景情况:
- 超导磁共振成像 (MRI) 系统需要对梯度线圈进行强大的屏蔽,以保持冷稳定性.
- 平面型超导MRI系统经常在主磁铁的开放槽内嵌入梯度线圈,利用高导电性材料.
研究的目的:
- 建议使用逐步增强的屏蔽线圈设计方法,为梯度线圈提出一种新的屏蔽约束.
- 优化梯度线圈性能,在球体体积 (DSV) 的指定直径内降低结构复杂性.
主要方法:
- 逐步增强屏蔽线圈设计的开发.
- 测量沿轴方向的磁场分布.
- 设计的梯度线圈产生的磁场分布的评估.
主要成果:
- 拟议的设计有效地抑制了漫游磁场,而不会增加线圈的复杂性.
- 在指定成像区域内实现了高度线性梯度场.
- 该设计符合在球体体积 (DSV) 规定的直径内的成像要求.
结论:
- 逐步增强的屏蔽线圈设计方法为MRI梯度线圈屏蔽提供了有效的解决方案.
- 这种方法平衡了性能优化,结构简单性和流浪场抑制.
- 这些发现有助于稳定和高性能超导MRI系统的发展.
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