使用高k介电材料用于模拟/射频应用的InSe-FET的性能优化
Md Akram Ahmad1,2, Muzaffar Imam1, Bhubon Chandra Mech3
1Department of ECE, Presidency University, Bengaluru, 560064, India.
Scientific reports
|March 11, 2026
概括
高k介电材料显著提升化 (InSe) 场效应晶体管 (FET) 的模拟和射频 (RF) 应用. 虽然增强增益,但这些材料略微降低了切断频率,显示了增益速度的权衡.
科学领域:
- 半导体物理 半导体物理
- 材料科学 材料科学 材料科学
- 纳米电子学纳米电子学
背景情况:
- 化 (InSe) 是下一代电子产品的一个有前途的二维材料.
- 场效应晶体管 (FET) 是现代电子电路的基本组成部分.
- 高k介电材料在设备扩展和性能方面具有优势.
研究的目的:
- 研究高k介电物的对基于InSe的FET性能的影响.
- 分析这些设备的数字和模拟/射频性能指标.
- 探索介电工程在先进电子应用中的潜力.
主要方法:
- 使用非平衡格林函数 (NEGF) 形式主义的原子模拟.
- 分析启动/关闭电流比 (ION/IOFF) 的数字适用性.
- 对模拟/射频指标的检查:内在增益 (AV),传导生成因子 (TGF) 和切断频率 (fT).
主要成果:
- 传导率 (gm) 的显著改善为98.3%,TGF为73.7%,AV为72.66%.
- 观察到截止频率 (fT) 略有降低,降低了9.85%.
- 设备增益与运行频率之间的证明权衡.
结论:
- 高k介电工程在优化基于InSe的FET方面是有效的.
- 这些优化的FET显示了下一代模拟和射频电路的潜力.
- 进一步的研究可以探索减轻观察到的增速权衡.
关键词:
2D 材料是二维材料.模拟/无线电频率 模拟/无线电场效应晶体管 (FET) 是一个高-k 材料的使用.非平衡的绿色函数 (NEGF)过渡金属二甲基化物 (TMD) 是一种过渡金属二甲基化物.更多相关视频
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