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Grain size distribution analysis in polycrystalline LiF thin films by mathematical morphology techniques on AFM
Cremona1, Mauricio, Scavarda Do Carmo LC
1Departamento de Física, Pontifícia Universidade Católica do Rio de Janeiro (PUC-Rio), Rua Marques São Vicente 225, 22453-900, Rio de Janeiro, Brazil; Centro Brasileiro de Pesquisas Físicas, Rua Dr Xavier Sigaud 150, 22290-180, Rio de Janeiro, Brazil; Departamento de Informática, Universidade Iguaçu/FaCET, Av. Abilio Augusto Tavora 2134, Nova Iguaçu, Rio de Janeiro, Brazil.
Abstract:
The influence of the deposition temperature on the grain size of polycrystalline lithium fluoride (LiF) thin films is studied using a mathematical morphology method. On atomic force microscopy images of the LiF surface, the grain sizes and shapes are determined by applying the watershed technique, together with a shape factor algorithm. Also, the domain size of the film structure, determined by an X-ray diffraction data analysis, is compared and correlated with the mean grain size as a function of the deposition temperature. In both cases a linear increase with temperature and a very good agreement among the two structural parameters (grain and domain size) was found.
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