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Chemical force microscopy of microcontact-printed self-assembled monolayers by pulsed-force-mode atomic force
1Department of Biomolecular Engineering, Tokyo Institute of Technology, Yokohama, Japan.
Ultramicroscopy
|March 31, 2000
Summary
Pulsed-force-mode atomic force microscopy (PFM-AFM) now images chemical groups by detecting adhesive forces. This novel method distinguishes surface chemistry, advancing chemical imaging capabilities.
Area of Science:
- Surface Science
- Chemical Imaging
- Atomic Force Microscopy
Background:
- Atomic force microscopy (AFM) traditionally maps surface topography.
- Existing methods lack direct chemical sensitivity for surface analysis.
- Distinguishing chemical functionalities on surfaces is crucial for materials science.
Purpose of the Study:
- To develop a chemically sensitive imaging mode using AFM.
- To utilize adhesive force detection for chemical discrimination.
- To demonstrate the capability of pulsed-force-mode AFM (PFM-AFM) for chemical mapping.
Main Methods:
- Employed pulsed-force-mode atomic force microscopy (PFM-AFM) for simultaneous topography and adhesive force imaging.
- Utilized chemically modified tips (CH3- and COOH-terminated) for enhanced chemical interaction.
- Applied microcontact printing (microCP) to create patterned self-assembled monolayers (SAMs) for testing.
Main Results:
- PFM-AFM successfully mapped adhesive forces, discriminating between CH3- and COOH-terminated regions on SAMs.
- Adhesive force mapping clearly visualized the distribution of different chemical functional groups.
- The mechanism of discrimination via adhesive forces was elucidated and compared to friction force microscopy.
Conclusions:
- Adhesive force mapping using PFM-AFM provides a novel, chemically sensitive imaging capability.
- This technique enables direct visualization of chemical functional group distribution on surfaces.
- PFM-AFM offers a valuable tool for surface analysis and chemical characterization.