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Updated: Jul 8, 2026

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
Published on: July 2, 2012
Patterning of polymer-supported metal films by microcutting
Stutzmann1, Tervoort, Bastiaansen
1Department of Materials, ETH Zentrum, Zurich, Switzerland.
Abstract:
The ability to micropattern materials is of great importance for manufacturing advanced electronic, optical and mechanical devices ranging from displays to biosensors. For this purpose a variety of methods have been developed, including X-ray, electron-beam and photo-lithography, microcontact printing, embossing, micromouldings and cold welding. But these techniques are often of restricted applicability, involve a multitude of elaborate and cumbersome processing steps, or require aggressive chemistry. Here we describe a simple and versatile way to create well resolved metallic structures on polymer substrates, which is based on solid-state embossing of metal-coated polymer films. Ductility of both the metal layer and the polymer substrate permits the metal to be cut into surprisingly regular, micrometre-size structures. We illustrate the method by preparing patterned electrically conducting structures, highly efficient infrared polarizers and polarization-dependent colour filters.

