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Published on: July 10, 2018
Mechanisms of ordering in striped patterns.
C Harrison1, D H Adamson, Z Cheng
1Department of Physics, Princeton Materials Institute, Princeton University, Princeton, NJ 08544, USA.
We studied how striped patterns in block copolymer thin films order. The main finding is that multiple disclinations annihilate together, which is key for understanding pattern formation and block copolymer lithography.
Area of Science:
- Materials Science
- Polymer Science
- Soft Matter Physics
Background:
- Block copolymers form ordered microdomain patterns in thin films.
- Understanding the dynamics of these patterns is crucial for applications like nanolithography.
- Disclinations are topological defects that influence pattern ordering.
Purpose of the Study:
- To investigate the ordering dynamics of cylindrical block copolymer microdomains in a thin film.
- To identify the dominant mechanism of disclination annihilation during annealing.
- To understand the role of topological constraints on pattern evolution.
Main Methods:
- Time-lapse atomic force microscopy was used to track disclinations.
- Annealing was performed to induce ordering.
- Analysis of kinetic scaling laws was conducted.
Main Results:
- A dominant mechanism of disclination annihilation involving three or four disclinations (quadrupoles) was observed.
- Pairwise disclination annihilation events were suppressed due to topological constraints.
- Observed kinetic scaling laws support multi-disclination annihilation events.
Conclusions:
- The study reveals key insights into the ordering dynamics of block copolymer patterns.
- Topological constraints significantly influence defect annihilation mechanisms.
- Findings contribute to the understanding of two-dimensional pattern formation and block copolymer lithography applications.
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