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Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
Control of island formation on silicon surfaces using ultra-high-vacuum scanning electron microscopy
1NTT Basic Research Laboratories, Atsugi, Kanagawa, Japan. homma@will.brl.ntt.co.jp
Journal of Electron Microscopy
|December 7, 2000
Abstract:
In situ scanning electron microscopy has been used to control Au island formation on a patterned Si(111) surface with a periodic array of atomic-step bunches and holes. Liquid phase Au-Si islands were observed to redistribute on the patterned surface by annealing. The islands accumulate at a particular position of the step bunch in each pattern unit. This phenomenon is interpreted in terms of the energetic stability of a droplet on a patterned surface.
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