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Osmium-metal coating device using hollow-cathode plasma CVD method.

H Akahori1, M Handa, H Yoshida

  • 1Vacuum Device Inc., Ibaraki, Japan. device@beige.ocn.ne.jp

Journal of Electron Microscopy
|March 29, 2001
PubMed
Summary
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A new osmium-metal coating device uses hollow-cathode plasma chemical vapor deposition (CVD) to prevent specimen charging during scanning electron microscopy (SEM). This method offers low-voltage deposition, minimizing ion bombardment damage and environmental impact.

Area of Science:

  • Materials Science
  • Surface Science
  • Analytical Chemistry

Background:

  • Specimen charging is a common issue in Scanning Electron Microscopy (SEM) observation, often requiring conductive coatings.
  • Traditional coating methods can damage delicate specimens due to ion bombardment or use hazardous materials.

Purpose of the Study:

  • To develop a novel osmium-metal coating device for SEM.
  • To prevent negative charge build-up on specimens using a new coating method.
  • To improve the safety and efficiency of SEM sample preparation.

Main Methods:

  • Utilized a hollow-cathode low voltage discharge plasma chemical vapor deposition (CVD) method.
  • Deposited osmium-metal coating directly onto specimens.
  • Explored the use of environmental gases (Ar, N2, air) mixed with OsO4.

Related Experiment Videos

  • Investigated hybrid coating capabilities with materials like platinum (Pt).

    • Main Results:

    • Achieved osmium-metal deposition at significantly lower discharge voltages compared to planar electrode methods.
    • Minimized ion bombardment damage to specimens.
    • Reduced OsO4 gas usage and potential air pollution.
    • Ensured a large coating area due to ion distribution within the hollow-cathode.
    • Demonstrated successful hybrid coatings combining plasma CVD and ion-sputter deposition.

    Conclusions:

    • The hollow-cathode plasma CVD method is an effective technique for osmium-metal coating in SEM.
    • This novel device offers advantages in specimen protection, environmental safety, and coating efficiency.
    • The method provides a versatile platform for advanced SEM sample preparation.