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Monomeric Titanium(IV) Azides as a New Route to Titanium Nitride.
Claire J. Carmalt1, Alan H. Cowley, Robert D. Culp
1Department of Chemistry & Biochemistry, The University of Texas at Austin, Austin, Texas 78712, Center for Materials Chemistry, The University of Texas at Austin, Austin, Texas 78712, and Institut für Anorganische Chemie der Universität, Tammannstrasse 4, D-37077, Göttingen, Germany.
Inorganic Chemistry
|July 2, 1997
Summary
New titanium nitride (TiN) precursors, [Ti(NMe(2))(2)(N(3))(2)](n) (1) and [Ti(NMe(2))(2)(N(3))(2)(py)(2)] (2), were synthesized. Precursor 2 yields superior TiN thin films on silica and nickel substrates.
Area of Science:
- Materials Science
- Inorganic Chemistry
- Chemical Engineering
Background:
- Titanium nitride (TiN) is a crucial material in various technological applications.
- Developing efficient precursors for TiN thin film deposition is essential for advanced manufacturing.
Purpose of the Study:
- To synthesize and characterize novel titanium-containing precursors for TiN thin film deposition.
- To evaluate the performance of these precursors in thin film formation.
Main Methods:
- Synthesis of titanium nitride precursors via reactions involving Ti(NMe(2))(4) and Me(3)SiN(3) in different solvent systems.
- Characterization of synthesized compounds using crystallographic data.
- Deposition of TiN thin films on silica and nickel substrates at elevated temperatures (300-400 °C).
Main Results:
- Four new titanium complexes, [Ti(NMe(2))(2)(N(3))(2)](n) (1), [Ti(NMe(2))(2)(N(3))(2)(py)(2)] (2), [Ti(NMe(2))(2)(N(3))(2)(bipy)] (3), and [Ti(NMe(2))(3)(N(3))(bipy)] (4), were successfully synthesized and characterized.
- Compounds 1 and 2 were employed as precursors for TiN thin film deposition.
- TiN films deposited using precursor 2 exhibited superior quality compared to those from precursor 1.
Conclusions:
- Novel titanium nitride precursors with tunable properties were developed.
- The choice of precursor significantly impacts the quality of deposited TiN thin films.
- Precursor 2 shows promise for high-quality TiN thin film fabrication.