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Pair contact process with a particle source
Ronald Dickman1, Wilson R M Rabêlo, Géza Odor
1Departamento de Física, ICEx, Universidade Federal de Minas Gerais, Caixa Postal 702, 30161-970, Belo Horizonte - MG, Brasil. dickman@fisica.ufmg.br
Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics
|January 22, 2002
Summary
We investigated the one-dimensional pair contact process (PCP) with a particle source. Results show critical exponents are largely unaffected by the source, confirming standard PCP scaling.
Area of Science:
- Statistical Physics
- Complex Systems
Background:
- The pair contact process (PCP) is a model for self-organization and pattern formation.
- Understanding the influence of external factors on critical phenomena is crucial.
Purpose of the Study:
- To analyze the phase diagram and critical behavior of the 1D PCP with a particle source.
- To determine how a particle source affects the critical point and exponents.
Main Methods:
- Cluster approximations
- Extensive computer simulations
Main Results:
- The critical point p(c) exhibits a singular dependence on source intensity.
- Critical exponents remain largely unchanged by the source, except possibly beta.
- High-precision values for standard PCP critical exponents were obtained, confirming directed-percolationlike scaling.
Conclusions:
- The particle source influences the critical point but not the universality class of the 1D PCP.
- The study confirms directed-percolationlike scaling for the standard PCP.