Direct-writing of polymer nanostructures: poly(thiophene) nanowires on semiconducting and insulating surfaces

A new technique for direct-writing of polymer nanostructures on insulating and semiconducting surfaces based on Electrochemical Dip-Pen Nanolithography (E-DPN) is described. The technique is based on electrochemical polymerization of monomers directly underneath the AFM tip. Sub-50 nm poly-3,4-ethylenedioxythiophene lines can be easily created. Such capability to direct-write and pattern polymeric materials with interesting electronic and electrooptical properties at the nanoscale creates a number of opportunities since a large variety of monomers are available.