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Improving the quality of electron backscatter diffraction (EBSD) patterns from nanoparticles.

J A Small1, J R Michael, D S Bright

  • 1National Institutes of Standards and Technology, Gaithersburg, MD 20899-8371, USA. john.small@nist.gov

Journal of Microscopy
|May 10, 2002
PubMed
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Electron backscatter diffraction (EBSD) pattern quality in nanoparticles is primarily degraded by electrons escaping the sample. Using thin-film TEM substrates significantly improves EBSD pattern quality for small particles.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Electron Microscopy

Background:

  • Electron backscatter diffraction (EBSD) pattern quality degrades for nanoparticles < 500 nm.
  • Conventional thick mounting substrates contribute to diffuse scattering, obscuring EBSD patterns.

Purpose of the Study:

  • Investigate factors affecting EBSD pattern quality in nanoparticles.
  • Determine the relative contributions of atomic number (Z) and density (rho).
  • Develop methods to improve EBSD analysis for small particles.

Main Methods:

  • Designed a sample holder for thin-film TEM substrates to minimize diffuse scattering.
  • Developed a quantitative 'quality' factor based on Hough transforms for EBSD patterns.
  • Compared EBSD pattern quality from Al(2)O(3) and Fe-Co nanoparticles on thick and thin substrates.

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Main Results:

  • Electrons escaping through the bottom of small nanoparticles are the dominant cause of poor EBSD pattern quality.
  • Thin-film TEM substrates significantly reduce background noise and improve EBSD pattern quality.
  • Usable EBSD patterns were obtained from Al(2)O(3) particles as small as 130 nm using the thin-film method.

Conclusions:

  • Minimizing electron escape through substrate design is crucial for high-quality EBSD on nanoparticles.
  • The thin-film substrate approach enables reliable EBSD analysis of nanoparticles < 500 nm.
  • This method overcomes limitations previously hindering nanoscale EBSD characterization.