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Related Experiment Videos

Direct numerical inversion method for kinetic ellipsometric data. II. Implementation and experimental verification.

Alfred Hofrichter1, Dmitri Kouznetsov, Pavel Bulkin

  • 1Laboratoire de Physique des Interfaces et des Couches Minces, Ecole Polytechnique, Palaiseau, France. Alfred.Hofrichter@saint-gobain.com

Applied Optics
|August 3, 2002
PubMed
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A direct numerical inversion method effectively monitors thin-film growth, even for weakly absorbing materials. This technique aids in process calibration for silicon oxynitride deposition and layer characterization.

Area of Science:

  • Materials Science
  • Optical Engineering
  • Computational Physics

Background:

  • Monitoring thin-film growth is crucial for material quality and device performance.
  • Accurate characterization of optical properties during deposition is challenging.
  • Existing methods may struggle with weakly absorbing or complex layered structures.

Purpose of the Study:

  • To present an improved direct numerical inversion method for real-time thin-film growth monitoring.
  • To enhance the method's applicability to a wider range of materials, including weakly absorbing ones.
  • To validate the method for process calibration in plasma-enhanced chemical vapor deposition (PECVD) and layered structure analysis.

Main Methods:

  • Application of a direct numerical inversion technique to optical monitoring data.

Related Experiment Videos

  • Incorporation of a correction factor for materials with low optical absorption.
  • Utilizing the method for process calibration of silicon oxynitride PECVD.
  • Testing the calibrated method on multilayer structures with varying refractive indices.

    • Main Results:

    • Successful application of the direct numerical inversion method to monitor thin-film growth.
    • Demonstrated improvement for weakly absorbing materials.
    • Effective process calibration achieved for silicon oxynitride PECVD.
    • Validated performance on complex layered structures including linear index gradients.

    Conclusions:

    • The improved direct numerical inversion method provides a robust tool for in-situ monitoring of thin-film deposition.
    • The method enables accurate process calibration, leading to better control over film properties.
    • This technique is valuable for fabricating complex optical coatings and functional thin films.