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A study of positive charge effect on AFM anodization lithography using metal phosphate monolayers
Sang Min Kim1, Sang Jung Ahn, Haeseong Lee
1Department of Chemistry, Hanyang University, Sungdong-ku, Seoul, South Korea.
Abstract:
Monolayer films of metal phosphate were prepared by sequential adsorption of phosphoric acid (PA) and metal ions (Zr4+ or Ca2+). The monolayer formation was confirmed and characterized by ellipsometry and atomic force microscopy (AFM). Nanometer-scale patterning on the self-assembled metal phosphate films has been achieved using AFM. The difference in AFM lithography on positively charged surfaces in the case of Zr4+ and Ca2+ ions was investigated and summarized. Since the presence of the positive charges allows electrons to move from a tip to a layer easily, the lithographic process initiates at a lower voltage in the layer of Zr2+ phosphate than in the layer of Ca phosphate or PA. Other lithographic results on metal phosphate layers were compared with those on a monolayer of PA.