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Chemical reactions and morphological stability at the Cu/Al2O3 interface

C Scheu1, S Klein, A P Tomsia

  • 1Max-Planck-Institut für Metallforschung, Heisenbergstr 3, 70569 Stuttgart, Germany. scheu@mf.mpg.de

Journal of Microscopy
|October 9, 2002
PubMed
Summary

Diffusion bonding of copper to aluminum oxide (Al2O3) forms a CuAlO2 interfacial layer. Annealing enhances adhesion significantly, with microstructural analysis revealing key bonding mechanisms.

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