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Related Experiment Videos

X-ray-ultraviolet beam splitters for the Michelson interferometer.

Franck Delmotte1, Marie-Françoise Ravet, Françoise Bridou

  • 1Laboratoire Charles Fabry de l'Institut d'Optique, Centre National de la Recherche Scientifique, Orsay, France. franck.delmotte@iota.u-psud.fr

Applied Optics
|October 10, 2002
PubMed
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Researchers developed a novel beam splitter for a 13.9 nm Michelson interferometer. This multilayered silicon nitride device achieves high reflectivity and transmission, enabling X-ray laser interferometry.

Area of Science:

  • Optics and Photonics
  • Materials Science
  • X-ray Optics

Background:

  • Michelson interferometers are crucial for precise measurements.
  • Operating interferometers at extreme ultraviolet (XUV) or soft X-ray wavelengths presents significant challenges.
  • Developing efficient beam splitters is key to advancing XUV/soft X-ray interferometry.

Purpose of the Study:

  • To design and fabricate a symmetrical beam splitter for a Michelson interferometer operating at 13.9 nm.
  • To achieve a high reflectivity-transmission product for optimal interferometer performance.
  • To demonstrate the utility of the beam splitter in X-ray laser Michelson interferometry.

Main Methods:

  • Simulations based on experimental optical properties of a silicon nitride membrane.

Related Experiment Videos

  • Deposition of optimized Molybdenum-Silicon (Mo-Si) multilayers using ion-beam sputtering.
  • Characterization of the beam splitter using synchrotron radiation at 13.9 nm and 45-degree incidence.

    • Main Results:

    • A symmetrical beam splitter with Mo-Si multilayers on a silicon nitride membrane was successfully fabricated.
    • Achieved thickness-period reproducibility of 0.1 nm during multilayer deposition.
    • Experimental measurements at 13.9 nm yielded 14.2% reflectivity and 15.2% transmission for 60% s-polarized light.

    Conclusions:

    • The developed beam splitter is suitable for a 13.9 nm Michelson interferometer.
    • The fabricated device performs close to simulated values, validating the design and deposition process.
    • The beam splitter was successfully employed in the first demonstration of X-ray laser Michelson interferometry at 13.9 nm.