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Updated: Aug 25, 2026
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DNA Origami-Mediated Substrate Nanopatterning of Inorganic Structures for Sensing Applications
Published on: September 27, 2019
Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer
Guo-Jun Zhang1, Takashi Tanii, Takashi Funatsu
1Nanotechnology Research Center, Waseda University, Waseda Tsurumaki-cho 513, Shinjuku-ku, Tokyo 162-0041, Japan. zhang@kaw.comm.waseda.ac.jp
Chemical Communications (Cambridge, England)
|March 27, 2004
Abstract:
Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.
