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Updated: Aug 25, 2026

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
Published on: July 12, 2016
Analytical performance of an r.f. capacitively coupled plasma for atomic emission with tip-ring electrode geometry
1Chemistry Department and Research Center for Analytical Instrumentation, University of Cluj, Of. P.5, PO Box 717, 3400, Cluj-Napoca, Romania.
Abstract:
A low to medium power radiofrequency capacitively coupled plasma is characterized as spectral source for atomic emission. The signal to background ratio and the limits of detection were determined for 19 elements as a function of the plasma torch geometry and the observation point.
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