Analysis of solids with a secondary-neutral microprobe based on electron-gas post-ionization

The detection sensitivity and the lateral resolution in electron-gas SNMS have been improved in a newly developed secondary-neutral microprobe. This instrument combines the high post-ionization efficiency provided by the electron component of an rf-plasma (post-ionization probability alpha(0) of some 10(-2)) with a high-transmission magnetic mass spectrometer. Using the plasma as an effective primary ion source, secondary-neutral intensities of up to 10(9) cps can be realized for 1 keV Ar(+) ion bombardment and a primary current density of 1 mA/cm(2). To obtain laterally resolved secondary-neutral micrographs, a 20 keV-Ga(+)-ion beam produced in a liquid-metal ion source (LMIS) is utilized for sputter excitation. At Ga(+)-ion-beam currents of about 6 nA a spot size on the target of 1 microm is possible. The detection sensitivity in this operation mode is on the order of