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Updated: Aug 23, 2026

A Guide to Structured Illumination TIRF Microscopy at High Speed with Multiple Colors
Published on: May 30, 2016
Image formation by use of the geometrical theory of diffraction
Andrew Khoh1, Ganesh S Samudra, Yihong Wu
1National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260. khohandrew@charteredsemi.com
Abstract:
A deeper understanding of imaging behavior is needed with the widespread adoption of optical proximity correction in advanced lithography processes. To gain insight into the printing behavior of different mask pattern configurations, we derive edge-based and vertex-based image models by combining concepts contained in the geometrical theory of diffraction and Hopkins's image model. The models are scalar models and apply to planar, perfectly conducting mask objects.
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