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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures

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Materials science. Fundamental size limits in ferroelectricity

Nicola A Spaldin1

  • 1Materials Department, University of California, Santa Barbara, CA 93106-5050, USA. nicola@mrl.ucsb.edu

Science (New York, N.Y.)
|June 12, 2004
PubMed
Summary

No abstract available in PubMed .

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