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Asymmetric phase masks for extended depth of field

Albertina Castro1, Jorge Ojeda-Castañeda

  • 1Instituto Nacional de Astrofísica, Optica y Electrónica, Apartado Postal 216, Puebla 72000, Puebla, Mexico. betina@inaoep.mx

Applied Optics
|June 29, 2004
PubMed

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