G Schitter1, R W Stark, A Stemmer
1Nanotechnology Group, Swiss Federal Institute of Technology, Tannenstrasse 3, ETH Zentrum CLA, CH-8092 Zurich, Switzerland.
This study introduces a model-based controller for atomic force microscopy (AFM) to enhance imaging speed. The new controller compensates for scanner dynamics, reducing artifacts for faster, clearer topographical imaging.
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