Related Experiment Videos
Design of beamline optics for EUVL
1Himeji Institute of Technology, 2167 Shosha, Himeji, Hyogo 671-22, Japan.
Journal of Synchrotron Radiation
|July 21, 2004
Abstract:
The design of front-end collimating optics for extreme-ultraviolet lithography (EUVL) is reported. For EUVL, collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror can achieve shorter optical path lengths than collimating optics consisting of two concave toroidal mirrors. Collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror are discussed. The design of collimating optics for EUVL beamlines based on ray-tracing studies is described.