Design, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers

Area of Science:

• Optics and Photonics
• Materials Science
• Semiconductor Manufacturing

Background:

• Extreme-ultraviolet (EUV) lithography is crucial for advanced semiconductor manufacturing.
• Traditional optical components face challenges in the EUV regime due to strong material absorption and short wavelengths.
• Diffusers, common in visible light, are difficult to implement effectively in EUV.

Purpose of the Study:

• To demonstrate the fabrication of efficient reflective diffusers for EUV lithography.
• To overcome the limitations of material absorption and short wavelengths in the EUV spectrum.
• To develop controllable bandwidth diffusers for EUV optical systems.

Main Methods:

• Fabrication of reflective diffusers specifically designed for the EUV wavelength range.
• Characterization of diffuser efficiency and angular bandwidth.
• Development of techniques to manage EUV light scattering and absorption.

Main Results:

• Achieved high efficiencies for reflective EUV diffusers, exceeding 10%.
• Demonstrated controllable bandwidth within a moderate angular range (approximately 0.06 rad).
• Successfully extended the application of diffuser components to the challenging EUV regime.

Conclusions:

• The developed reflective EUV diffusers are efficient and offer controllable bandwidth.
• These diffusers represent a significant advancement for optical component development in EUV lithography.
• The fabrication techniques pave the way for broader implementation of optical solutions in EUV applications.