Shoji Sadayama1, Yasuhiko Sugiyama, Koji Iwasaki
1SII NanoTechnology Inc., Sunto-gun, Shizuoka 410-1393, Japan. shouji.sadayama@sii.co.jp
A new Gallium (Ga+) ion beam method was developed for thinning membranes on a mesh. This technique successfully prepared specimens for transmission electron microscopy of silicon dynamic random-access memory cells.
You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: