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Generating an etch resistant "resist" layer from common solvents using scanning probe lithography in a fluid cell
Itai Suez1, Scott A Backer, Jean M J Fréchet
1Department of Chemistry, University of California, Berkeley, CA 94720-1460, USA.
Nano Letters
|March 30, 2005
Summary
This study introduces a new scanning probe lithography method using organic solvents to create nanoscale patterns. This technique generates etch-resistant materials for high-resolution negative-tone patterning.
Area of Science:
- Nanotechnology
- Materials Science
- Surface Chemistry
Background:
- Scanning probe lithography (SPL) is a key technique for nanoscale fabrication.
- Existing SPL methods often face limitations in material versatility and pattern tone.
- Field-induced processes offer potential for novel material deposition and patterning.
Purpose of the Study:
- To develop a novel scanning probe lithography scheme for nanoscale pattern generation.
- To investigate the use of common organic solvents in field-induced deposition.
- To achieve negative-tone patterning with high resolution.
Main Methods:
- Utilizing a liquid cell with a scanning probe tip to apply a field.
- Generating etch-resistant material via field-induced decomposition of organic solvents (n-octane, toluene, ethyl alcohol, dioxane).
- Employing an ammonium fluoride/hydrogen peroxide/water etchant for pattern transfer.
Main Results:
- Successfully demonstrated field-induced deposition of etch-resistant material from organic solvents.
- Achieved the formation of 7 nm tall posts through negative-tone lithography.
- Observed distinct negative-tone patterning, contrasting with positive-tone results using water.
Conclusions:
- A novel, versatile scanning probe lithography method has been established.
- Field-induced decomposition of organic solvents is a viable route for creating nanoscale etch-resistant materials.
- This technique enables high-resolution negative-tone patterning for advanced nanofabrication.