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Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
Published on: November 9, 2015
Hydrogen peroxide evolution during V-UV photolysis of water
Kamal Azrague1, Eric Bonnefille, Vincent Pradines
1Laboratoire des I.M.R.C.P., Université P. Sabatier, 118 rte de Narbonne, 31062, Toulouse, France.
Abstract:
Hydrogen peroxide evolution during the vacuum-ultraviolet (V-UV, 172 nm) photolysis of water is considerably affected by the presence of oxalic acid (employed as a model water pollutant) and striking differences are observed in the absence and in the presence of dioxygen.
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