Determination of trace silica in highly purified water based on delayed quenching of Rhodamine B through nanoparticle...

The development of a highly sensitive analytical method for trace silica is an urgent necessity for the real-time monitoring of highly purified water used in the semiconductor industry. However, there are no reports of a simple yet sensitive method for the determination of trace silica. Here we describe the delayed quenching phenomenon of Rhodamine B cation caused by nanoparticle formation with molybdosilicate ions in aqueous solution and its application to the one-step determination of trace silica at ppt to low ppb levels. We found that the quenching takes place over several minutes and the quenching time is dependent on the concentration of silica. The measurements made by a dynamic light scattering particle size analyzer indicated that the diameter of the particles were at nanometer levels. The detection limit was found to be 34 ng dm(-3) Si (1.2 x 10(-9) mol dm(-3)). The average quenching time for 1 microg dm(-3) was 239 s with an RSD of 2.2% (n= 7). The proposed method has been successfully applied to distilled and highly purified water samples. There was good agreement between the results obtained by the proposed method and those by ICP-three dimensions quadrupole MS/MS with 11-fold evaporation concentration. The main point of this method is that in the trace determination of silica, the signal is larger at lower concentrations. The advantages of the proposed method are that it can be used as real-time monitoring for trace silica in highly purified water, and will be a great aid to industries in which the quality control of water is crucial.