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Fabricating Nanogaps by Nanoskiving
Published on: May 13, 2013
Bridging dimensions: demultiplexing ultrahigh-density nanowire circuits
Robert Beckman1, Ezekiel Johnston-Halperin, Yi Luo
1Division of Chemistry and Chemical Engineering, California Institute of Technology, MC 127-72, 1200 East California Boulevard, Pasadena, CA 91125, USA.
Abstract:
A demultiplexer is an electronic circuit designed to separate two or more combined signals. We report on a demultiplexer architecture for bridging from the submicrometer dimensions of lithographic patterning to the nanometer-scale dimensions that can be achieved through nanofabrication methods for the selective addressing of ultrahigh-density nanowire circuits. Order log2(N) large wires are required to address N nanowires, and the demultiplexer architecture is tolerant of low-precision manufacturing. This concept is experimentally demonstrated on submicrometer wires and on an array of 150 silicon nanowires patterned at nanowire widths of 13 nanometers and a pitch of 34 nanometers.

