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Self-assembled patterns and strain-induced instabilities for modulated systems.

Eliana Asciutto1, Christopher Roland, Celeste Sagui

  • 1Center for High Performance Simulations and Department of Physics, The North Carolina State University, Raleigh, North Carolina 27695-8202 USA.

Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics
|October 4, 2005
PubMed
Summary

Self-assembled domain patterns in modulated systems arise from competing interactions. These patterns, influenced by system strain, create diverse, long-lived states useful for nanostructure fabrication.

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Area of Science:

  • Materials Science
  • Condensed Matter Physics
  • Chemical Physics

Background:

  • Self-assembled domain patterns are prevalent in various chemical and physical systems.
  • These patterns result from the interplay of competing interactions.
  • Domain patterns are technologically significant as templates for nanostructure fabrication.

Purpose of the Study:

  • To analyze the formation of domains and instabilities in modulated systems.
  • To understand the factors governing the variety of self-assembled patterns.
  • To explore the role of system strain in pattern formation.

Main Methods:

  • Analysis of domain formation and instabilities in modulated systems.
  • Investigation of the relationship between equilibrium modulation period and system strain.

Related Experiment Videos

  • Characterization of long-lived metastable or glassy states.

    • Main Results:

    • A wide variety of domain patterns can be formed.
    • Pattern formation is a compromise between equilibrium modulation and system strain.
    • Topologically constrained phase space trajectories lead to strain, precluding equilibrium configurations.

    Conclusions:

    • Modulated systems exhibit diverse self-assembled patterns driven by competing interactions.
    • System strain, arising from constrained phase space trajectories, significantly influences pattern formation.
    • These patterns, including metastable states, offer potential for nanostructure fabrication.