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Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds
Published on: December 2, 2013
The preparation of a phosphorus doped silicon film from phosphorus containing silicon nanoparticles
Richard K Baldwin1, Jing Zou, Katherine A Pettigrew
1Department of Chemistry, University of California, One Shields Avenue, Davis, CA 95616, USA.
Chemical Communications (Cambridge, England)
|February 1, 2006
Abstract:
Phosphorus containing and octyl-terminated silicon nanoparticles (NPs) are generated by a solution reduction route under room temperature conditions for the first time and characterized by TEM, HRTEM, EDX, 1H/13C/31P NMR, EPR, and PL spectroscopy, then annealed to form a thin film with phosphorus doping confirmed by microprobe elemental analyses.
