Fabrication of three-dimensional photonic crystals with two-beam holographic lithography

A holographic technique used to fabricate three-dimensional photonic crystals with a two-beam interference method is presented. In the optical setup of fabrication one beam is incident on the recording plate in the direction of the plate normal and the other beam with an angle to the normal. Three exposures were taken. Between each exposure, the recording plate was rotated 120 degrees on axis until three exposures were completed. Good three-dimensional lattice structures have been obtained. Theoretical analysis, computer simulations, and experimental results are presented.