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Solvent-induced novel morphologies in diblock copolymer blend thin films

Yongzhong Chen1, Zongbao Wang, Yumei Gong

  • 1State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Graduate School of the Chinese Academy of Sciences, Changchun, Jilin 130022, People's Republic of China.

Summary

We explored how blending polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers and using a selective solvent affects thin film morphology. This reveals new ways to control polymer self-organization and create unique microstructures.

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